Infrastructure with detection system, cleanroom environment assembly, lithography and glove box for prototyping and development of detector systems that allows for fast and efficient development cycles. For microstructures the key infrastructure is hosted in a class 100 area (see fig. 1).  Major components are a Karl Süss MA4 image setter for  4’’ wafers, a spin coater and two optical microscopes (enlargement < 1000) equipped with a digital camera. The area also provides a bench for chemistry with exhaust hood and purified water supply. For the work with chemically unstable materials and low humidity ( < 1ppm), a 2 m² inert gas glove box (see fig. 2) with a 40 cm vacuum lock and a big door to bring in also large equipment up to 1 m size is available. Electrical and electronics interfaces for innovative detector concepts typically use wire bonding for extremely reliable and dense connection patterns; the setup contains a manual ultrasonic wire bonder with precision table and a microscope (see fig. 3).

Typical applications: gas detectors, optical detectors, semiconductor detection systems, structured foils for cell biology, positron masks, Csl based photon detectors